Extreme ultraviolet photoemission of a tin-based photoresist-Reference-Cited by-同舟云学术

Extreme ultraviolet photoemission of a tin-based photoresist

Published:2021-04-26 Issue:17 Volume:118 Page:171903
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Zhang Yu¹,Haitjema Jarich¹,Castellanos Sonia¹^ORCID,Lugier Olivier¹^ORCID,Sadegh Najmeh¹^ORCID,Ovsyannikov Ruslan²,Giangrisostomi Erika²^ORCID,Johansson Fredrik O. L.³^ORCID,Berggren Elin³^ORCID,Lindblad Andreas³^ORCID,Brouwer Albert M.⁴⁵^ORCID

Affiliation:

1. Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands

2. Institute Methods and Instrumentation for Synchrotron Radiation Research, Helmholtz-Zentrum Berlin BmbH, Albert-Einstein Straße 15, 12489 Berlin, Germany

3. X-ray Photon Science, Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, 75237 Uppsala, Sweden

4. Advanced Research Center for Nanolithography, Science Park 110, 1098 XG Amsterdam, The Netherlands

5. University of Amsterdam, van 't Hoff Institute for Molecular Sciences, Science Park 904, 1098 XH Amsterdam, The Netherlands

Funder

Swedish Science Council

Helmholtz Zentrum Berlin beamtime

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0047269