Optical properties of silicon nitride films deposited by hot filament chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359062
Reference37 articles.
1. Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] System
2. The electronic properties of plasma‐deposited films of hydrogenated amorphous SiNx(0
3. Physical‐Electrical Properties of Silicon Nitride Deposited by PECVD on III–V Semiconductors
4. Low hydrogen content silicon nitride deposited at low temperature by novel remote plasma technique
5. Silicon nitride and silicon diimide grown by remote plasma enhanced chemical vapor deposition
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