Molecular content of the deposition flux during reactive Ar∕O2 magnetron sputtering of Al
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2170404
Reference25 articles.
1. Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
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4. Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers
5. Effect of ion irradiation during deposition on the structure of alumina thin films grown by plasma assisted chemical vapour deposition
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