An analytical model of multi-component radio frequency capacitively coupled plasma and experimental validation
Author:
Affiliation:
1. Institute of Physics, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Santiago, Chile
Funder
Fondo Nacional de Desarrollo Científico y Tecnológico (FONDECYT)
Comisión Nacional de Investigación Científica y Tecnológica (CONICYT)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4973233
Reference35 articles.
1. Power dissipation and impedance measurements in radio‐frequency discharges
2. Influence of plasma excitation frequency fora-Si:H thin film deposition
3. Transition between different regimes of rf glow discharges
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