Two‐dimensional hybrid model of inductively coupled plasma sources for etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.109963
Reference10 articles.
1. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
2. Review of inductively coupled plasmas for plasma processing
3. Optical ion energy measurements in a radio‐frequency‐induction plasma source
4. Electron energy distribution function measurements in a planar inductive oxygen radio frequency glow discharge
5. Electromagnetic fields in a radio‐frequency induction plasma
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