Advanced high-k dielectric amorphous LaGdO3 based high density metal-insulator-metal capacitors with sub-nanometer capacitance equivalent thickness
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4812670
Reference28 articles.
1. High-density MIM capacitors using Al2O3 and AlTiOx dielectrics
2. A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics
3. High Density and Low Leakage Current in $ \hbox{TiO}_{2}$ MIM Capacitors Processed at 300 $^{\circ} \hbox{C}$
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