Activation characteristics of ion-implanted Si+ in AlGaN

Author:

Irokawa Y.,Fujishima O.,Kachi T.,Pearton S. J.,Ren F.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Selective area doping of GaN toward high-power applications;Journal of Physics D: Applied Physics;2023-06-13

2. GaN-based power high-electron-mobility transistors on Si substrates: from materials to devices;Semiconductor Science and Technology;2023-04-25

3. Ohmic contact formation to GaN by Ge+ implantation doping: Implantation fluence and encapsulation layer studies;Materials Science in Semiconductor Processing;2022-08

4. N-type conduction of sputter-deposited polycrystalline Al0.78Sc0.22N films by Si ion implantation;Applied Physics Express;2021-01-12

5. Characterization of silicon ion-implanted GaN and AlGaN;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-02

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