Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339258
Reference26 articles.
1. Hydrogenation and dehydrogenation of amorphous and crystalline silicon
2. Hydrogenation of evaporated amorphous silicon films by plasma treatment
3. Hydrogenation and doping of vacuum-evaporated a-Si
4. High current post‐hydrogenated chemical vapor deposited amorphous siliconp‐i‐ndiodes
5. Hydrogen Implantation into CVD Amorphous Silicon
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1. The Ageing of μPlasma-Modified Polymers: The Role of Hydrophilicity;Materials;2024-03-19
2. Effects of Film Quality of Hydrogenated Amorphous Silicon Grown by Thermal Chemical-Vapor-Depositon on Subsequentin-situHydrogenation Processes;Japanese Journal of Applied Physics;2000-06-15
3. In SituHydrogenation of Amorphous Silicon Prepared by Thermal Decomposition of Disilane;Japanese Journal of Applied Physics;1993-10-01
4. Posthydrogenation of low‐pressure chemical‐vapor‐deposited amorphous silicon using a novel internal lamp system and its application to thin‐film transistor fabrication;Journal of Applied Physics;1992-10
5. Role of Atomic Hydrogen During Growth of Hydrogenated Amorphous Silicon in the “Chemical Annealing”;Japanese Journal of Applied Physics;1991-04-15
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