Influence of composition and bottom electrode properties on the local conductivity of TiN/HfTiO2 and TiN/Ru/HfTiO2 stacks-Reference-Cited by-同舟云学术

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Influence of composition and bottom electrode properties on the local conductivity of TiN/HfTiO2 and TiN/Ru/HfTiO2 stacks

Published:2011-01-03 Issue:1 Volume:98 Page:012901
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Martin Dominik,Grube Matthias,Reinig Peter,Oberbeck Lars,Heitmann Johannes,Weber Walter M.,Mikolajick Thomas,Riechert Henning

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3533802

Reference11 articles.

1. Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics

2. Leakage currents at crystallites in ZrAlxOy thin films measured by conductive atomic-force microscopy

3. Local charge transport in nanoscale amorphous and crystalline regions of high-k (Zr02)0.8(Al2O3)0.2 thin films

4. High-<tex>$kappa$</tex>/Metal–Gate Stack and Its MOSFET Characteristics

5. The High-k Solution

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1. Fundamentals of CAFM Operation Modes;Conductive Atomic Force Microscopy;2017-08-16

2. Charge transfer highways in polymer solar cells embedded with imprinted PEDOT:PSS gratings;RSC Adv.;2014

3. Filamentary resistive switching in amorphous and polycrystalline Nb2O5 thin films;Solid-State Electronics;2012-06

4. Structure and electrical properties of sputtered TiO2/ZrO2 bilayer composite dielectrics upon annealing in nitrogen;Nanoscale Research Letters;2012-01-05

5. Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen;Thin Solid Films;2012-01

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