Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride-Reference-Cited by-同舟云学术

Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride

Published:2012-10-15 Issue:8 Volume:112 Page:086103
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Oks Efim M.,Anders André

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4759310

Reference21 articles.

1. A. Ehiasarian, in Plasma Surface Engineering Research and Its Practical Applications, edited by R. Wei (Research Signpost, Kerala, India, 2008), p. 35.

2. An introduction to thin film processing using high-power impulse magnetron sputtering

3. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

4. High power impulse magnetron sputtering discharge

5. Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion

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