Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2717141
Reference16 articles.
1. Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
2. Transfer etching of bilayer resists in oxygen-based plasmas
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4. Resist line edge roughness and aerial image contrast
5. Line-Edge Roughness: Characterization and Material Origin
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