Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass

Author:

Bhatnagar Parijat,Panda Siddhartha,Edleman Nikki L.,Allen Scott D.,Wise Richard,Mahorowala Arpan

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Wet Chemical and Plasma Etching of Photosensitive Glass;Solids;2023-08-21

2. Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-11

3. Line width roughness and its control on photomask;SPIE Proceedings;2013-09-09

4. In-plane spectroscopy of microfluidic systems made in photosensitive glass;Microsystem Technologies;2012-07-24

5. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-01

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