Emission spectroscopy during direct‐current‐biased, microwave‐plasma chemical vapor deposition of diamond
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110055
Reference9 articles.
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4. Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter deposition
5. An optical emission study of the glow‐discharge deposition of hydrogenated amorphous silicon from argon‐silane mixtures
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