A comparative study of the electron trapping and thermal detrapping in SiO2prepared by plasma and thermal oxidation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351703
Reference30 articles.
1. Silicon Oxidation in an Oxygen Plasma Excited by Microwaves
2. Silicon Oxide Films Grown in a Microwave Discharge
3. Preparation and properties of plasma-anodized silicon dioxide films
4. An improvement of the interface properties of plasma anodized SiO2/Si system for the fabrication of MOSFET's
5. Plasma oxidation of silicon
Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ultrafast Meets Ultrasmall: Where Are the Limits of Ultrafast Waveguide Writing?;Springer Series in Optical Sciences;2023
2. Monte-Carlo simulation and experimental study of the effect of internal charging on the electron emission yield of amorphous SiO2 thin films;Journal of Electron Spectroscopy and Related Phenomena;2022-12
3. Bias Temperature Instability of MOSFETs: Physical Processes, Models, and Prediction;Electronics;2022-04-28
4. Design, Process, and Characterization of Complementary Metal–Oxide–Semiconductor Circuits and Six-Transistor Static Random-Access Memory in 4H-SiC;ECS Journal of Solid State Science and Technology;2022-04-01
5. Breakdown Voltage Walk-in Phenomenon and Optimization for the Trench-Gate p-Type VDMOS Under Single Avalanche Stress;IEEE Transactions on Electron Devices;2020-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3