The influence of incorporated nitrogen on the thermal stability of amorphous HfO2 and Hf silicate
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2353262
Reference20 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Influence of Charge Traps within HfSiON Bulk on Positive and Negative Bias Temperature Instability of HfSiON Gate Stacks
3. Crystallization kinetics and microstructure-dependent leakage current behavior of ultrathin HfO2 dielectrics: In situ annealing studies
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