Statistical analysis of semiconductor devices
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1390499
Reference15 articles.
1. Random dopant induced threshold voltage lowering and fluctuations in sub-0.1 μm MOSFET's: A 3-D "atomistic" simulation study
2. Solution of the nonlinear Poisson equation of semiconductor device theory
3. Effects of microscopic fluctuations in dopant distributions on MOSFET threshold voltage
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1. Variability analysis of the epitaxial layer TFET due to gate work function variation, random dopant fluctuation, and oxide thickness fluctuation using the statistical impedance field method;Semiconductor Science and Technology;2022-04-21
2. Impact of process variability in junctionless FinFETs due to random dopant fluctuation, gate work function variation, and oxide thickness variation;Semiconductor Science and Technology;2020-02-14
3. Adjoint method for the optimization of insulated gate bipolar transistors;AIP Advances;2019-09
4. Analysis of Sensitivity of PEMFC Parameters to Non-Uniform Platinum Deposition;ECS Transactions;2017-08-24
5. Sensitivity of Breakdown Voltage of Power Transistors to Dopant Impurities;ECS Transactions;2017-08-17
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