Pure and conformal CVD nickel and nickel monosilicide in high-aspect-ratio structures analyzed by atom probe tomography-Reference-Cited by-同舟云学术

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Pure and conformal CVD nickel and nickel monosilicide in high-aspect-ratio structures analyzed by atom probe tomography

Published:2017-05-07 Issue:17 Volume:121 Page:175301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Li Kecheng¹,Feng Jun²,Kwak Junkeun³,Yang Jing¹,Gordon Roy G.¹²^ORCID

Affiliation:

1. John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA

2. Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA

3. Samsung Electronics Co., Ltd., Nongseo-Dong, Giheung-Gu, Yongin-city, Gyeonggi-Do 446-711, South Korea

Funder

Samsung

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4982670

Reference27 articles.

1. Electrical contacts to one- and two-dimensional nanomaterials

2. Roadmap for 22nm and beyond (Invited Paper)

3. Ultra-Low Contact Resistance of Epitaxially Interfaced Bridged Silicon Nanowires

4. Characterization of a Self‐Aligned Cobalt Silicide Process

5. Single-crystal metallic nanowires and metal/semiconductor nanowire heterostructures

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1. Continuous-Flow Separation and Efficient Concentration of Foodborne Bacteria from Large Volume Using Nickel Nanowire Bridge in Microfluidic Chip;Micromachines;2019-09-25

2. A nickel(II) guanidinate compound and its potential as CVD precursor for nickel related films;Polyhedron;2018-12

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