GaAs‐oxide removal using an electron cyclotron resonance hydrogen plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104397
Reference19 articles.
1. Cleaning of MBE GaAs Substrates by Hydrogen Radical Beam Irradiation
2. GaAs cleaning with a hydrogen radical beam gun in an ultrahigh-vacuum system
3. Hydrogen plasma etching of GaAs oxide
4. Hydrogen plasma etching of GaAs oxide
5. Interactions between H2and N2plasmas and a GaAs(100) surface: Chemical and electronic properties
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