Transition metal contacts to graphene
Author:
Affiliation:
1. KU Leuven, 3001 Leuven, Belgium
2. imec, Kapeldreef 75, 3001 Leuven, Belgium
3. SAIT, Samsung Electronics Co., Suwon 443-803, South Korea
4. Intel Corporation, 2200 Mission College Blvd, Santa Clara, California 95054, USA
Funder
imec Industrial Affiliation Program
Fonds Wetenschappelijk Onderzoek (FWO)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4933192
Reference42 articles.
1. The origins and limits of metal–graphene junction resistance
2. Determination of Work Function of Graphene under a Metal Electrode and Its Role in Contact Resistance
3. Low contact resistance metals for graphene based devices
4. Contact resistance in top-gated graphene field-effect transistors
5. Contact resistance in few and multilayer graphene devices
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