Exposing high-energy surfaces by rapid-anneal solid phase epitaxy-Reference-Cited by-同舟云学术

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Exposing high-energy surfaces by rapid-anneal solid phase epitaxy

Published:2017-08 Issue:8 Volume:5 Page:086103
ISSN:2166-532X
Container-title:APL Materials
language:en
Short-container-title:APL Materials

Author:

Wang Y.¹^ORCID,Song Y.²,Peng R.²,Herklotz A.¹,Chisholm M. F.¹,Wu Z. L.²,Ward T. Z.¹^ORCID,Weitering H. H.¹³^ORCID,Snijders P. C.¹³

Affiliation:

1. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

2. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

3. Department of Physics and Astronomy, The University of Tennessee, Knoxville, Tennessee 37996, USA

Funder

Basic Energy Sciences (BES)

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4992004

Reference59 articles.

1. Epitaxial Growth and Properties of Doped Transition Metal and Complex Oxide Films

2. Strongly Correlated Materials

3. Transition Metal Oxides for Organic Electronics: Energetics, Device Physics and Applications

4. A highly active and stable IrO x /SrIrO 3 catalyst for the oxygen evolution reaction

5. Control of octahedral connectivity in perovskite oxide heterostructures: An emerging route to multifunctional materials discovery

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