Ion energy and angular distributions in inductively driven radio frequency discharges in chlorine
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.364383
Reference33 articles.
1. Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors
2. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges
3. Power deposition in high‐density inductively coupled plasma tools for semiconductor processing
4. Effects of atomic chlorine wall recombination: Comparison of a plasma chemistry model with experiment
5. Continuum modeling of radio‐frequency glow discharges. I. Theory and results for electropositive and electronegative gases
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