Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3627155
Reference20 articles.
1. Influence of RF power on the structure and optical properties of sputtered hafnium dioxide thin films
2. Advantages of evaporation of hafnium in a reactive environment formanufacture of high-damage-threshold multilayer coatings by electron-beam deposition
3. Formation of Reliable HfO2/HfSixOyGate-Dielectric for Metal-Oxide-Semiconductor Devices
4. Investigations of the interface stability in HfO2–metal electrodes
5. Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices
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