Annealing influence on optical performance of HfO2 thin films

Author:

Khan Sadaf BashirORCID,Zhang Zhengjun,Lee Shern LongORCID

Funder

NSFC

Shenzhen University, Guangdong government

Shenzhen Key Lab Fund

China postdoctoral Science foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference57 articles.

1. HfO2 nanorod array as high-performance and high-temperature antireflective coating;Khan;Adv. Mater. Interfaces,2017

2. Investigation of SiO 2/HfO 2 gate stacks for application to non-volatile memory devices;Buckley;Solid State Electron.,2005

3. Fluctuations in nanoscale magnetoelectronics devices;Fan;J. Appl. Phys.,2012

4. Magnetic properties of HO2 thin films;Hadacek;J. Phys. Condens. Matter,2007

5. Impact of high-Κ properties on mosfet electrical characteristics;Pantisano,2006

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