Multi-shot damage on Mo/Si multilayer induced by nanosecond EUV radiation-Reference-Cited by-同舟云学术

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Multi-shot damage on Mo/Si multilayer induced by nanosecond EUV radiation

Published:2021-01-01 Issue:1 Volume:11 Page:015201
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Li Wenbin¹²,Pan Liuyang¹²,Wang Chunlin¹²,Zhang Zhe¹²,Xie Chun³,Huang Qiushi¹²,Wang Zhanshan¹²^ORCID

Affiliation:

1. MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai 200092, China

2. Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

3. Sino-German College of Applied Sciences, Tongji University, 200092 Shanghai, China

Funder

National Natural Science Foundation of China

National Key Research and Development Program of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0035490

Reference27 articles.

1. Operation of a free-electron laser from the extreme ultraviolet to the water window

2. Highly coherent and stable pulses from the FERMI seeded free-electron laser in the extreme ultraviolet

3. Stable femtosecond X-rays with tunable polarization from a laser-driven accelerator

4. Metasurface-based multi-harmonic free-electron light source

5. Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on the UV FEL single-shot damage threshold of an Au thin film;Journal of Synchrotron Radiation;2024-07-23

2. 6.X nm下一代极紫外多层膜技术研究进展;Chinese Journal of Lasers;2024

3. Ultrafast Time-Resolved Pump–Probe Investigation of Nanosecond Extreme Ultraviolet-Light-Induced Damage Dynamics on B₄C/Ru Nano-Bilayer Film;Nano Letters;2022-06-27

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