Combinatorial and high-throughput measurements of the modulus of thin polymer films
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1906085
Reference22 articles.
1. Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water
2. Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms
3. Mechanism of Resist Pattern Collapse during Development Process
4. Review of instrumented indentation
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