Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3243980
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1. Growth mode during initial stage of chemical vapor deposition
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4. Enhancement of diamond CVD nucleation on quartz by high dose titanium implantation
5. Chromium diboride thin films by low temperature chemical vapor deposition
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