Quantitative analysis of total reflection X-ray fluorescence from finely layered structures using XeRay-Reference-Cited by-同舟云学术

Quantitative analysis of total reflection X-ray fluorescence from finely layered structures using XeRay

Published:2017-03 Issue:3 Volume:88 Page:033112
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Gong Zhiliang¹²,Kerr Daniel³,Hwang Hyeondo Luke¹²,Henderson J. Michael¹²,Suwatthee Tiffany⁴,Slaw Benjamin R.¹²^ORCID,Cao Kathleen D.¹²,Lin Binhua¹⁵,Bu Wei⁵^ORCID,Lee Ka Yee C.¹²⁵

Affiliation:

1. James Franck Institute, The University of Chicago, Chicago, Illinois 60637, USA

2. Department of Chemistry, The University of Chicago, Chicago, Illinois 60637, USA

3. Program in the Biophysical Sciences, Institute for Biophysical Dynamics, The University of Chicago, Chicago, Illinois 60637, USA

4. The College, The University of Chicago, Chicago, Illinois 60637, USA

5. Center for Advanced Radiation Sources, The University of Chicago, Chicago, Illinois 60637, USA

Funder

National Science Foundation (NSF)

U.S. Department of Energy (DOE)

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4978654

Reference31 articles.

1. Membrane recognition by phospholipid-binding domains

2. Calcium Signaling

3. Multilayer Thin Films

4. Reference-Free Total Reflection X-ray Fluorescence Analysis of Semiconductor Surfaces with Synchrotron Radiation

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