Stress in thermal SiO2during growth
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.90905
Reference7 articles.
1. Influence of film stress and thermal oxidation on the generation of dislocations in silicon
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3. Viscous Shear Flow Model for MOS Device Radiation Sensitivity
4. Viscous flow of thermal SiO2
5. Temperature dependence of critical stress in oxygen‐free silicon
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