Synchrotron radiation assisted deposition of carbon films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102225
Reference6 articles.
1. A review of laser–microchemical processing
2. Low‐temperature growth of polycrystalline Si and Ge films by ultraviolet laser photodissociation of silane and germane
3. Synchrotron radiation‐excited chemical vapor deposition of SixNyHzfilm
4. Synchrotron radiation-excited chemical-vapor deposition and etching
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2. Deposition of Polyethylene Thin Films Using Synchrotron Radiation Ablation;Japanese Journal of Applied Physics;1999-02-15
3. Synchrotron‐Radiation‐Excited Etching of Silicon Wafer Enhanced by Disk‐Shaped CF 4 Plasma;Journal of The Electrochemical Society;1996-12-01
4. Synchrotron-Radiation-Induced Deposition of Etch-Protecting Film on Si inCF4Plasma;Japanese Journal of Applied Physics;1996-02-15
5. Electronic and Nuclear Relaxation Of Core-Excited Molecules;VUV and Soft X-Ray Photoionization;1996
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