A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating
Author:
Affiliation:
1. Department of Chemistry, Bar-Ilan University, Ramat-Gan 5920002, Israel
2. Bar-Ilan University Institute for Nanotechnology and Advanced Materials, Ramat-Gan 5920002, Israel
Funder
Israel National Nanotechnology Initiative
Israel Science Foundation (ISF)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4936088
Reference40 articles.
1. Triple-gate metal–oxide–semiconductor field effect transistors fabricated with interference lithography
2. Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193-nm Optical Lithography
3. Basic structures for photonic integrated circuits in Silicon-on-insulator
4. Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography
5. Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures
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