Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching-Reference-Cited by-同舟云学术

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Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching

Published:2015-03-16 Issue:11 Volume:106 Page:111110
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Chiles Jeff¹,Malinowski Marcin¹,Rao Ashutosh¹,Novak Spencer¹²,Richardson Kathleen¹²,Fathpour Sasan¹³

Affiliation:

1. CREOL, The College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816, USA

2. Department of Materials Science and Engineering, COMSET, Clemson University, Clemson, South Carolina 29634, USA

3. Department of Electrical Engineering and Computer Science, University of Central Florida, Orlando, Florida 32816, USA

Funder

National Science Foundation (NSF)

Office of Naval Research (ONR)

Defense Threat Reduction Agency (DTRA)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4916207

Reference16 articles.

1. Chalcogenide photonics

2. Integrated flexible chalcogenide glass photonic devices

3. High-Performance, High-Index-Contrast Chalcogenide Glass Photonics on Silicon and Unconventional Non-planar Substrates

4. Polarization-independent chalcogenide glass nanowires with anomalous dispersion for all-optical processing

5. Si-CMOS-compatible lift-off fabrication of low-loss planar chalcogenide waveguides

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