Carrier Profile Change for Phosphorus‐Diffused Layers on Low‐Temperature Heat Treatment
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1653892
Reference10 articles.
1. PRE‐PRECIPITATION OF PHOSPHORUS IN HEAVILY DOPED SILICON
2. Detailed analysis of thin phosphorus-diffused layers in p-type silicon
3. Resistivity of Bulk Silicon and of Diffused Layers in Silicon
4. Silicon Phosphide Precipitates in Diffused Silicon
5. Crystallography of SiP and SiAs Single Crystals and of SiP Precipitates in Si
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