Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3134487
Reference20 articles.
1. Mechanistic study of plasma damage of low k dielectric surfaces
2. Structural Change in Porous Silica Thin Film after Plasma Treatment
3. Effect of oxygen plasma exposure of porous spin-on-glass films
4. Radical Reactions with Organic Thin Films: Chemical Interaction of Atomic Oxygen with an X-ray Modified Self-Assembled Monolayer
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