Pulsed plasma‐pulsed injection sources for remote plasma activated chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352840
Reference3 articles.
1. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
2. Simulation of the gas‐phase processes in remote‐plasma‐activated chemical‐vapor deposition of silicon dielectrics using rare gas–silane‐ammonia mixtures
3. Surface reaction and recombination of the SiH3radical on hydrogenated amorphous silicon
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