Microstructural evolution of diamond films from CH4/H2/N2 plasma and their enhanced electrical properties
Author:
Affiliation:
1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
2. Department of Physics, Tamkang University, Tamsui 251, Taiwan
Funder
National Science Council Taiwan
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4913258
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