Matrix isolation study of the interaction of excited neon atoms with SiF4: Infrared spectra of SiF+3 and SiF−3
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.470726
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1. Negative and positive ions from CF4and CF4/O2rf discharges in etching Si
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3. Cross section measurements for electron-impact dissociation of SiF4into neutral radicals
4. The valence electron spectrum of SiF4
5. Photoionization mass spectrometry of the fluoromethylsilanes (CH3)nF4-nSi (n = 1-4)
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