Generation and Identification of the Trifluorosilylarsinidene F3SiAs and Isomeric Perfluorinated Arsasilene FAsSiF2

Abstract

AbstractThe trifluorosilylarsinidene F3SiAs in the triplet ground state has been generated through the reaction of laser‐ablated silicon atoms with AsF3 in cryogenic Ne‐ and Ar‐matrices. The reactions proceed with the initial formation of perfluorinated arsasilene FAsSiF2 in the singlet ground state by two As−F bonds insertion reaction on annealing. The trifluorosilylarsinidene F3SiAs was formed via F‐migration reactions of FAsSiF2 under irradiation at UV light (λ = 275 nm). The characterization of FAsSiF2 and F3SiAs by IR matrix‐isolation spectroscopy is supported by computations at CCSD(T)‐F12/aug‐cc‐pVTZ and B3LYP/aug‐cc‐pVTZ levels of theory.