Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2995988
Reference20 articles.
1. The energy balance at substrate surfaces during plasma processing
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5. Wafer-Grown Heat Flux Sensor Arrays for Plasma Etch Processes
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