Film thickness reduction of thermally annealed hydrogenated amorphous silicon prepared with plasma‐enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111841
Reference21 articles.
1. Performance of thin-film transistors on polysilicon films grown by low-pressure chemical vapor deposition at various pressures
2. High-mobility poly-Si thin-film transistors fabricated by a novel excimer laser crystallization method
3. Characteristics of thin film transistors fabricated in polysilicon films deposited by plasma enhanced chemical vapor deposition
4. Polysilicon Films Prepared by Plasma Enhanced Chemical Vapor Deposition: Effect of Substrate Temperatureand Annealing Temperature
5. Leakage Current Reduction of Poly-Si Thin Film Transistors by Two-Step Annealing
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