Auger analysis of silicon thin films deposited on carbon at high temperatures

Author:

Chang Chin‐An,Siekhaus Wigbert J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A historical review of glassy carbon: Synthesis, structure, properties and applications;Carbon Trends;2021-10

2. Computational study of the properties of silicon thin films on graphite;Russian Journal of Physical Chemistry A;2017-11-03

3. Growth kinetics of stoichiometric SiC layers formed by high fluence carbon implantation into silicon using a metal vapor vacuum arc ion source;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2005-01

4. Boron‐induced morphology changes in silicon chemical vapor deposition: A scanning tunneling microscopy study;Applied Physics Letters;1995-04-17

5. References;Thin Films by Chemical Vapour Deposition;1990

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