Effects of composition control on crystallographic and magnetic characteristics of Ba ferrite films sputtered with the mixture of Xe, Kr, Ar, and O2 for recording media-Reference-Cited by-同舟云学术

Effects of composition control on crystallographic and magnetic characteristics of Ba ferrite films sputtered with the mixture of Xe, Kr, Ar, and O2 for recording media

Published:1997-04-15 Issue:8 Volume:81 Page:4377-4379
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Noma K.,Matsushita N.,Nakagawa S.,Naoe M.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.364829

Reference3 articles.

1. Ba ferrite films with large saturation magnetization and high coercivity prepared by low-temperature sputter deposition

2. Monte Carlo calculation of the thermalization of atoms sputtered from the cathode of a sputtering discharge

3. Facing targets type of sputtering method for deposition of magnetic metal films at low temperature and high rate

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1. Effects of the oxygen partial pressure during deposition on the material characteristics and magnetic properties of BaM thin films;Journal of Alloys and Compounds;2012-10

2. Direct Al cathode layer sputtering on LiF∕Alq3 using facing target sputtering with a mixture of Ar and Kr;Applied Physics Letters;2006-02-20

3. Low temperature deposition ofc-axis oriented Sr-ferrite thin films prepared by facing targets sputtering with mixture gas of Ar and Kr;Journal of Applied Physics;2003-05-15

4. Perpendicular Recording Media;The Physics of Ultra-High-Density Magnetic Recording;2001

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