Metal‐containing fluoropolymer films produced by simultaneous plasma etching and polymerization: Effects of hydrogen or oxygen
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.327491
Reference13 articles.
1. Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
2. Plasma etching A ’’pseudo‐black‐box’’ approach
3. The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6
4. The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6
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