Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursor-Reference-Cited by-同舟云学术

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Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursor

Published:2017-02-07 Issue:5 Volume:146 Page:052814
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Duan Yichen¹,Teplyakov Andrew V.¹

Affiliation:

1. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, USA

Funder

National Institute of General Medical Sciences (NIGMS)

Division of Materials Research (DMR)

Division of Chemistry (CHE)

University of Delaware Research Foundation (UDRF)

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4971287

Reference56 articles.

1. Initial- and final-state effects on metal cluster/substrate interactions, as determined by XPS: copper clusters on Dow Cyclotene and highly oriented pyrolytic graphite

2. Supported Metal Clusters: Synthesis, Structure, and Catalysis

3. Size-dependent catalytic activity of supported metal clusters

4. Oxide-supported metal clusters: models for heterogeneous catalysts

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