Photoluminescence study of MgGa2O4 spinel oxide films grown by molecular beam epitaxy

Abstract

As a promising ultrawide bandgap oxide semiconductor material in the spinel family, magnesium gallate (MgGa2O4) exhibits great potential applications in power electronics, transparent electronics, and deep ultraviolet optoelectronics. However, few studies reveal its photoluminescence (PL) properties. In this work, MgGa2O4 films were grown by using oxygen plasma assisted molecular beam epitaxy. The bandgap of MgGa2O4 spinel films is determined to be around 5.4–5.5 eV, and all samples have transmittance over 90% in the visible spectral range. X-ray diffraction patterns confirmed that the spinel films were grown highly along ⟨111⟩ oriented. Power and temperature dependent PL studies were investigated. Optical transitions involving self-trapped hole, oxygen vacancy deep donor, and magnesium atom on gallium site deep acceptor levels were revealed.