Model-based image quality optimization for submicron direct laser writing-Reference-Cited by-同舟云学术

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Model-based image quality optimization for submicron direct laser writing

Published:2020-12-01 Issue:12 Volume:10 Page:125121
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Yang Shang¹^ORCID,Zhang Libin¹^ORCID,Wei Yayi¹^ORCID

Affiliation:

1. Institute of Microelectronics Chinese Academy of Sciences, No. 3 Beitucheng West Rd., Beijing 100029, China and Guangdong Greater Bay Area Institute of Integrated Circuit and System, Room 206, Building A, No. 136, Kaiyuan Avenue, Huangpu District, Guangzhou 510535, China

Funder

National Key Research and Development Project

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/6.0000595

Reference29 articles.

1. A physical model for innovative laser direct write lithography

2. Laser direct writing of carbonaceous sensors on cardboard for human health and indoor environment monitoring

3. Designable 3D nanofabrication by femtosecond laser direct writing

4. Direct laser writing of micro-supercapacitors on hydrated graphite oxide films

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1. All-Optical Magnetothermoelastic Skyrmion Motion;Physical Review Applied;2023-04-12

2. Lateral proximity effect in direct laser thermochemical recording on thin titanium films;Optical and Quantum Electronics;2023-04-08

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