Effect of power on interface and electrical properties of SiO2films produced by plasma‐enhanced chemical‐vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.358913
Reference23 articles.
1. Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
2. Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
3. Energy Considerations in the Deposition of High‐Quality Plasma‐Enhanced CVD Silicon Dioxide
4. Effect of Power on the Properties of SiO2 Films Produced by Plasma-Enhanced Chemical Vapour Deposition
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