Recrystallization of carbon–aluminum ion coimplanted epitaxial silicon carbide—evidenced by room temperature optical measurements
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.124412
Reference25 articles.
1. Thin film deposition and microelectronic and optoelectronic device fabrication and characterization in monocrystalline alpha and beta silicon carbide
2. Al and B ion‐implantations in 6H‐ and 3C‐SiC
3. Nitrogen implantation in (100)‐β‐SiC layers grown on Si substrate
4. Defect annealing in ion implanted silicon carbide
5. Phosphorus‐related donors in 6H‐SiC generated by ion implantation
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