Deep levels in Si‐implanted and thermally annealed semi‐insulating GaAs:Cr

Author:

Rhee Jin K.,Bhattacharya Pallab K.,Koyama Richard Y.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Rapid thermal annealing of the through-film silicon implantation on GaAs;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-07

2. Atomic hydrogen passivation of deep levels activity in AlxGa1−xAs multiquantum well structures;Solid State Communications;1990-11

3. Characterization of ion‐implanted and rapidly thermal annealed GaAs by Raman scattering and van der Pauw measurement;Journal of Applied Physics;1990-06-15

4. Oxygen-related deep centres in LEC grown GaAs crystals;Solid State Communications;1990-02

5. Ion Implantation in Iii–V Semiconductors;Materials Processing: Theory and Practices;1989

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