Enhanced thermal stability of yttrium oxide-based RRAM devices with inhomogeneous Schottky-barrier-Reference-Cited by-同舟云学术

Enhanced thermal stability of yttrium oxide-based RRAM devices with inhomogeneous Schottky-barrier

Published:2020-07-06 Issue:1 Volume:117 Page:013504
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Piros Eszter¹^ORCID,Petzold Stefan¹^ORCID,Zintler Alexander²^ORCID,Kaiser Nico¹^ORCID,Vogel Tobias¹^ORCID,Eilhardt Robert²^ORCID,Wenger Christian³⁴^ORCID,Molina-Luna Leopoldo²^ORCID,Alff Lambert¹^ORCID

Affiliation:

1. Advanced Thin Film Technology Division, Institute of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany

2. Advanced Electron Microscopy Division, Institute of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany

3. IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

4. Brandenburg Medical School Theodor Fontane, Fehrbelliner Str. 38, 16816 Neuruppin, Germany

Funder

Deutsche Forschungsgemeinschaft

Deutscher Akademischer Austauschdienst

Bundesministerium für Bildung und Forschung

Electronic Components and Systems for European Leadership

H2020 European Research Council

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)