Multistacked Al2O3∕HfO2∕SiO2 tunnel layer for high-density nonvolatile memory application
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2756849
Reference15 articles.
1. On the go with SONOS
2. Design considerations in scaled SONOS nonvolatile memory devices
3. Layered tunnel barriers for nonvolatile memory devices
4. VARIOT: a novel multilayer tunnel barrier concept for low-voltage nonvolatile memory devices
5. Investigation of SiO2/HfO2 gate stacks for application to non-volatile memory devices
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