High Resistivity of dc‐Sputtered Metal Films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1659781
Reference11 articles.
1. Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics
2. High resistivity sputtered tantalum films for microelectronic applications
3. Metal Films Sputtered at Low Voltages
4. Determination of Argon in Thin Films by rf Spark‐Source Mass Spectrography
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